Publications

10 results for Romain Lallement

Low-n absorber EUV masks: mask manufacturing assessment through process characterization and optimization with early look at EUV Low-NA and High-NA imaging performance
- - Henry Kamberian
  - Jed Rankin
  - et al.
- 2024
- SPIE Photomask Technology + EUV Lithography 2024
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
- - Romain Lallement
  - Daniel Schmidt
  - et al.
- 2023
- OEN 2023
Focus considerations of design pitches and absorber choice for EUV random logic
- - Martin Burkhardt
  - Zheng Chen
  - et al.
- 2022
- OEN 2022
Vertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices
- - H. Jagannathan
  - B. Anderson
  - et al.
- 2021
- IEDM 2021
Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- - Jennifer Church
  - Graham Jensen
  - et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
Effect of high NA "half-field" printing on overlay error
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUVL mask process development and verification using advanced modeling and characterization techniques
- - Michael Green
  - Romain Lallement
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUV processing and characterization for BEOL
- - Nicole Saulnier
  - Yongan Xu
  - et al.
- 2015
- SPIE Advanced Lithography 2015