Publications

2 results for Veeraraghavan Basker

Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Nanosheet Metrology Opportunities for Technology Readiness
- - Mary Breton
  - Daniel Schmidt
  - et al.
- 2021
- SPIE Advanced Lithography 2021