Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
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Exploration of pillar local CDU improvement options for AI applications
- Charlie Liu
- Hao Tang
- et al.
- 2020
- SPIE Advanced Lithography 2020
Investigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018