Publications

3 results for Zhengqing John Qi

Printability of buried extreme ultraviolet lithography photomask defects
- - Kazunori Seki
  - Takeshi Isogawa
  - et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
EUV photomask defects: What prints, what doesn't, and what is required for HVM
- - Jed Rankin
  - Zhengqing John Qi
  - et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- - Greg McIntyre
  - Leon Teeuwen
  - et al.
- 2013
- SPIE Advanced Lithography 2013