Surface etching and roughening in integrated processing of thermal oxides
- M. Offenberg
- M. liehr
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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49 results for Michael Liehr
Ultraclean, integrated processing of thermal oxide structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- Applied Physics Letters
Vapor phase hydrocarbon removal for Si processing
- Srinandan R. Kasi
- M. Liehr
- 1990
- Applied Physics Letters
Kinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor
- M. Liehr
- C.M. Greenlief
- et al.
- 1990
- Applied Physics Letters
Role of surface passivation in the integrated processing of MOS structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- VLSI Technology 1990
HF surface passivation failure in integrated thermal oxidation processing
- M. Liehr
- M. Offenberg
- et al.
- 1990
- SSDM 1990
Silicon dioxide defects induced by metal impurities
- H. Dallaporta
- M. Liehr
- et al.
- 1990
- Physical Review B
In-situ characterization of impurities and defects at si interfaces
- M. Liehr
- 1989
- Proceedings of SPIE 1989
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4
- C.M. Greenlief
- M. Offenberg
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
integrated thermal chemical vapor deposition processing for Si technology
- M. Liehr
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films