Low pressure chemical vapor deposition of oxide from SiH4/O 2: Chemistry and effects on electrical properties
- M. Liehr
- S. Cohen
- 1992
- Applied Physics Letters
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Kinetics of nucleation and growth of Si on SiO2 in very low pressure SiH4 chemical vapor deposition
- S.S. Dana
- M. Liehr
- et al.
- 1992
- Applied Physics Letters
Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics
- S.R. Kasi
- M. Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation and growth of silicon on Si02 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- M. Liehr
- S.S. Dana
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis studies of copper chemical vapor deposition from 1,5-cyclooctadiene-copper(l)-hexafluoroacetylacetonate
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactivity of a fluorine passivated silicon surface
- Ruud A. Haring
- Michael Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Chemistry of fluorine in the oxidation of silicon
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
In-situ characterization of SiO2 deposition and growth for gate-oxides (Invited Paper)
- M. Liehr
- 1991
- SPIE Processing Integration 1991
HF and UV-ozone integrated wafer preclean: chemistry and effects on thermal gate oxide
- M. Liehr
- S.R. Kasi
- 1991
- SSDM 1991