Publications

2 results for Ben Bleiman

Lithographic qualification of high-Transmission mask blank for 10nm node and beyond
- - Yongan Xu
  - Tom Faure
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- - Karen D. Badger
  - Michael Hibbs
  - et al.
- 2013
- SPIE Photomask Technology 2013