Publications

3 results for Jason Osborne

Line top loss and line top roughness characterizations of EUV resists
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- - Mary Breton
  - Jennifer Fullam
  - et al.
- 2020
- SPIE Advanced Lithography 2020
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- - Shimon Levi
  - Ishai Schwarzband
  - et al.
- 2014
- SPIE Advanced Lithography 2014