Publications

3 results for Katie Lutker-Lee

Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- - Katie Lutker-Lee
  - Jennifer Church
  - et al.
- 2022
- Journal of Vacuum Science and Technology B
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)
- - Yannick Feurprier
  - Katie Lutker-Lee
  - et al.
- 2015
- SPIE Advanced Lithography 2015