Publications

14 results for Todd Bailey

Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- - Nobuhiro Okai
  - Erin Lavigne
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gate
- - K. Henson
  - H. Bu
  - et al.
- 2008
- IEDM 2008
A SiCOH BEOL interconnect technology for high density and high performance 65 nm CMOS applications
- - Matthew Angyal
  - Jason Gill
  - et al.
- 2005
- AMC 2005
First microprocessors with immersion lithography
- - D. Gil
  - T. Bailey
  - et al.
- 2005
- SPIE Advanced Lithography 2005