Publications

3 results for Stephen Hsu

Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- - Michael Crouse
  - L. Liebmann
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- - M. Burkhardt
  - Sean Burns
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Dark field double dipole lithography (DDL) for 45nm node and beyond
- - Stephen Hsu
  - Martin Burkhardt
  - et al.
- 2006
- Photomask and Next-Generation Lithography Mask Technology 2006