Publications

3 results for Yulu Chen

Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- - Michael Crouse
  - L. Liebmann
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defects
- - Erik Verduijn
  - Pawitter Mangat
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Comparison of left and right side line edge roughness in lithography
- - Lei Sun
  - Nicole Saulnier
  - et al.
- 2016
- SPIE Advanced Lithography 2016