Directional and preferential sputtering-based physical vapor deposition
- S.M. Rossnagel
- 1995
- Thin Solid Films
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97 results for Stephen Rossnagel
Simulations of trench-filling profiles under ionized magnetron sputter metal deposition
- S. Hamaguchi
- S.M. Rossnagel
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Filling dual damascene interconnect structures with AlCu and Cu using ionized magnetron deposition
- S.M. Rossnagel
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Measured radial and angular distributions of sputtered atoms in a planar magnetron discharge
- G.M. Turner
- S.M. Rossnagel
- et al.
- 1994
- Journal of Applied Physics
Magnetron sputter deposition with high levels of metal ionization
- S.M. Rossnagel
- J. Hopwood
- 1993
- Applied Physics Letters
Dynamic interactions in the physical properties of magnetron deposition systems
- S.M. Rossnagel
- 1991
- Materials Science and Engineering: A
Compositional changes during magnetron sputtering of alloys
- S.M. Rossnagel
- I. Yang
- et al.
- 1991
- Thin Solid Films
Collimated magnetron sputter deposition
- S.M. Rossnagel
- D.J. Mikalsen
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The effects of substrate potentials on electron cyclotron resonance plasmas
- S.M. Rossnagel
- S.J. Whitehair
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Sputtered atom transport processes
- S.M. Rossnagel
- 1990
- IEEE Transactions on Plasma Science