Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- T. Nogami
- S. Lane
- et al.
- 2005
- Optics East 2005
Publications
13 results for P. McLaughlin
High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL
- W.-H. Lee
- A. Waite
- et al.
- 2005
- IEDM 2005
0.18 μm high-performance logic technology
- S.W. Crowder
- S. Greco
- et al.
- 1999
- VLSI Technology 1999