Porous ILD process development for sub 100nm integrationK. MaloneS.T. Chenet al.2003ADMETA 2003Conference paper
Structure-property relationships of hydrido organo siloxane polymer (HOSP)Ann R. FornofChristy Tyberget al.2002Polymer BulletinPaper
Opportunities and challenges in ultra low k dielectrics for interconnect applicationsS. PurushothamanS.V. Nittaet al.2001Technical Digest-International Electron Devices MeetingPaper