Publications

8 results for Geng Han

Line edge roughness reduction for 7nm metals
- - Zheng Chen
  - Steve McDermott
  - et al.
- 2018
- SPIE Advanced Lithography 2018
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
- - S. Narasimha
  - P. Chang
  - et al.
- 2012
- IEDM 2012
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- - Greg McIntyre
  - Michael Hibbs
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Pre-Si estimation and compensation of SRAM layout deficiencies to achieve target performance and yield
- - Aditya Bansal
  - Rama N. Singh
  - et al.
- 2008
- ICCD 2008
Challenges of implementing contour modeling in 32nm technology
- - Daniel Fischer
  - Geng Han
  - et al.
- 2008
- SPIE Advanced Lithography 2008
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008