Publications

10 results for Bradley Morgenfeld

Line edge roughness reduction for 7nm metals
- - Zheng Chen
  - Steve McDermott
  - et al.
- 2018
- SPIE Advanced Lithography 2018
E-beam hot spot inspection for early detection of systematic patterning problems for a 22 nm SOI technology
- - Oliver D. Patterson
  - Deborah A. Ryan
  - et al.
- 2014
- IEEE Trans Semicond Manuf
Strategies for single patterning of contacts for 32nm and 28nm technology
- - Bradley Morgenfeld
  - Ian Stobert
  - et al.
- 2011
- ASMC 2011
Contact patterning strategies for 32nm and 28nm technology
- - Bradley Morgenfeld
  - Ian Stobert
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- - Henning Haffner
  - Martin Ostermayr
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Characterization of novel TiN/HfO₂ metal insulator semiconductor stack for 32nm eDRAM
- - Puneet Goyal
  - Sneha Gupta
  - et al.
- 2010
- IEEE International SOI Conference 2010
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- - Greg McIntyre
  - Michael Hibbs
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Benefits and trade-offs of global source optimization in optical lithography
- - Kehan Tian
  - Azalia Krasnoperova
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Contact mask optimization and SRAF design
- - Uwe P. Schroeder
  - Cyrus Tabery
  - et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008