Publications

8 results for Tsuyoshi Furukawa

Polymer brush as adhesion promoter for EUV patterning
- - Jing Guo
  - Anuja De Silva
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- - Kristin Schmidt
  - Hitoshi Osaki
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016