Functional Testing of AI Cores through Thinned 3D I/O Buffer Dies in 3D Die-Stacked ModulesMukta FarooqArvind Kumaret al.2022ECTC 2022
Process trace analytics for process developmentRobert J. BasemanFateh A. Tipuet al.2021SPIE Advanced Lithography 2021
Simulation of 3D Doping by Plasma Immersion Ion Implantation for FinFET or deep Trench Doping Applications. Effect of main Process Parameters and Study of Wall Doping Non-Uniformity as Function of Form Factor and Device ScalingFrank TorregrosaBenjamin Rouxet al.2018IIT 2018
Particle reduction in back end of line plasma-etching process: CFM: Contamination free manufacturingLijuan ZouAlex Vagheseet al.2018ASMC 2018