Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013
Conference paper
Publications
23 results for Dan Dechene
Computational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperEnergy efficient QoS constrained scheduler for SC-FDMA uplink
- Dan J. Dechene
- Abdallah Shami
- 2013
- Physical Communication
Paper