Publications

3 results for Elisa Novelli

Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Dose reduction strategies for low-n PSM absorber using pupil and mask bias optimization at 0.33NA EUV lithography
- - Rajiv Sejpal
  - Gopal Kenath
  - et al.
- 2025
- Photomask Japan 2025
Predicting and Measuring Scummed Contact Holes
- - Elisa Novelli
  - Chris A. Mack
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025