Publications

2 results for Rajiv Sejpal

Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Guided Random Synthetic Layout Generation and Machine-Learning Based Defect Prediction for Leading Edge Technology Node Development
- - Geng Han
  - Mohamed Talbi
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025