The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
4 results for C. Hoelzel
New Photoacid Generators Designed for Advanced EUV Patterning
- Kamal P. Pandey
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
- P. Labeaume
- K. Hernandez
- et al.
- 2024
- SPIE Advanced Lithography 2024
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024