Publications

2 results for Belle Antonovich

High Volume Manufacturing Innovations for Metal-Oxide Resist Patterning
- - Nicholas Latham
  - Jennifer Church
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Fully subtractive Ru Topvia interconnects with minimum 9 nm-space airgap for RC performance and reliability enhancement as post-Cu interconnects
- - Koichi Motoyama
  - Jaemyung Choi
  - et al.
- 2024
- IEDM 2024