Publications

3 results for Will Parkin

Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- - Padraig Timoney
  - Stefan Schoeche
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paper
Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and Beyond
- - Ruqiang Bao
  - Yusuke Oniki
  - et al.
- 2024
- IEDM 2024
Conference paper
Wet Etch Recipe Optimization for Enabling RMG Multi Vt Scheme
- - Alma Vela Ramirez
  - Sankar Sankarapandian
  - et al.
- 2024
- ASMC 2024
Conference paper