Base-catalyzed photosensitive polyimideDennis R. McKeanGregory M. Waliraffet al.1993Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithographyRoderick R. KunzRobert D. Allenet al.1993Microlithography 1993
New chemistry in the i)esign of chemically amplified positive resistsRobert D. AllenQuan P. Lyet al.1993Microlithography 1993