Publications

3 results for Gary Spinillo

Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- - Willard Conley
  - Ravindra Akkapeddi
  - et al.
- 1994
- Microlithography 1994
TAR processing for CD control in I-line and 248 nm lithography
- - Christopher Lyons
  - Nicholas Eib
  - et al.
- 1993
- Microlithography 1993
Negative tone aqueous developable resist for photon electron and X-ray lithography
- - Willard Conley
  - Wayne Moreau
  - et al.
- 1990
- Microlithography 1990