Publications

69 results for Dario Goldfarb

Studies of acid diffusion in low Ea chemically amplified photoresists
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2005
- Microlithography 2005
Interfacial structure of photoresist thin films in developer solutions
- - Vivek M. Prabhu
  - Bryan D. Vogt
  - et al.
- 2005
- Microlithography 2005
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- Microlithography 2005
Positive resists based on non-polymeric macromolecules
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- - Vivek M. Prabhu
  - Bryan D. Vogt
  - et al.
- 2005
- Langmuir
X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- - Joseph L. Lenhart
  - Daniel A. Fischer
  - et al.
- 2005
- Langmuir
Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology
- - Bryan D. Vogt
  - Christopher L. Soles
  - et al.
- 2005
- Journal of Microlithography, Microfabrication and Microsystems
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- - Vivek M. Prabhu
  - Michael X. Wang
  - et al.
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- - Spyridon Skordas
  - Ryan L. Burns
  - et al.
- 2004
- Microlithography 2004