Stoichiometry reversal and depth-profiling in the growth of thin oxynitride films with N2O on Si(100) surfacesD.G.J. SutherlandH. Akatsuet al.1996Journal of Electron Spectroscopy and Related PhenomenaPaper
Stoichiometry reversal in the growth of thin oxynitride films on Si(100) surfacesD.G.J. SutherlandH. Akatsuet al.1995Journal of Applied PhysicsPaper
Surface and interface analysis at 3rd generation light sourcesF.J. HimpselH. Akatsuet al.1995Progress in Surface SciencePaper