Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation
- Jean M. J. Fréchet
- Man-Kit Leung
- et al.
- 1997
- Chemistry of Materials
Paper
Publications
3 results for Claus P. Niesert
Resist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Conference paperRecent advances in chemically amplified resist materials
- C.G. Willson
- J.F. Cameron
- et al.
- 1992
- ACS PMSE 1992
Conference paper