Publications

4 results for Mark Klare

In-line XPS metrology for area selective deposition processes on patterned structures
- - Manasa Medikonda
  - Linda Wangoh
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- - Daniel Schmidt
  - Aron Cepler
  - et al.
- 2022
- IEEE Trans Semicond Manuf
Paper
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Conference paper
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- - R. Muthinti
  - Nicolas Loubet
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paper