Publications

2 results for D. Latulip

Positive bilayer resists for 248- and 193-nm lithography
- - Ratnam Sooriyakumaran
  - Gregory M. Wallraff
  - et al.
- 1998
- Microlithography 1998
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 1998
- J. Photopolym. Sci. Tech.