Publications

2 results for Karen A. Hullihen

Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- - Thomas I. Wallow
  - Phillip J. Brock
  - et al.
- 1998
- Microlithography 1998
Platform-dependent properties of 193nm single layer resists
- - Robert D. Allen
  - Thomas I. Wallow
  - et al.
- 1998
- J. Photopolym. Sci. Tech.