Publications

5 results for J. Thackeray

Development of APSM resists for sub-200 nm contact holes
- - M. Rajaratnam
  - M. Reilly
  - et al.
- 1999
- Microelectronic Engineering
Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- - Hiroshi Ito
  - G. Breyta
  - et al.
- 1997
- ACS Spring 1997
A new positive DUV photoresist optimized for 0.25 μm isolated lines
- - T. Lindsay
  - G.G. Barclay
  - et al.
- 1997
- Microelectronic Engineering
Lithographic feasibility of escap beyond quarter micron
- - Hiroshi Ito
  - Greg Breyta
  - et al.
- 1996
- J. Photopolym. Sci. Tech.
Correlation of UVIIHS resist chemistry to dissolution rate measurements
- - J. Thackeray
  - T.H. Fedynyshyn
  - et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures