Publications

3 results for Ann Marie Mewherter

Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- - Thomas I. Wallow
  - P.J. Brock
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- - R.D. Allen
  - Juliann Opitz
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- - P. Rao Varanasi
  - Ann Marie Mewherter
  - et al.
- 1999
- J. Photopolym. Sci. Tech.