Publications

2 results for Frank Schmidt

Performance data on new tunable attenuating PSM for 193nm and 157nm lithography
- - Hans Becker
  - Frank Schmidt
  - et al.
- 2004
- Photomask and Next-Generation Lithography Mask Technology 2004
Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
- - Hans Becker
  - Jay Chey
  - et al.
- 2003
- SPIE Photomask Technology 2003