Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
8 results for M. Morrison
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Conference paperManipulation of surface properties by patterning of covalently bound polymer brushes [22]
- Marc Husemann
- Michael Morrison
- et al.
- 2000
- JACS
PaperExperimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperChemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
Conference paperNovel methods for the fabrication of well-defined and patterned polymer brushes
- Didier Benoit
- Marc Husemann
- et al.
- 1999
- ACS Spring 1999
Conference paperFactors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
PaperDeep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper