Publications

2 results for E.V. Tressler

PREVAIL-EPL alpha tool: Early results
- - S.D. Golladay
  - H.C. Pfeiffer
  - et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- - H.C. Pfeiffer
  - R.S. Dhaliwal
  - et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures