PREVAIL-EPL alpha tool: Early results
- S.D. Golladay
- H.C. Pfeiffer
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
3 results for R.A. Kendall
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High emittance source for the PREVAIL projection lithography system
- S.D. Golladay
- R.A. Kendall
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures