Publications

2 results for Brian Ashe

Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- - David R. Medeiros
  - Karen E. Petrillo
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
- - Brian Ashe
  - Christina Deverich
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering