Publications

6 results for George Jordhamo

Post-modification as a way to improve the lithographic performance of resist materials
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- - Ranee Kwong
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel classes of cyclic olefin polymers for 193 nm lithography
- - P. Rao Varanasi
  - R.D. Allen
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- - Hiroshi Ito
  - R.D. Allen
  - et al.
- 2000
- Microlithography 2000
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- - Zhijian G. Lu
  - Yuping Cui
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- - P. Rao Varanasi
  - Ann Marie Mewherter
  - et al.
- 1999
- J. Photopolym. Sci. Tech.