A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Publications
5 results for C.K. Magg
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Recent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering