Publications

3 results for B. Brunsvold

Evolution of a 193 nm bilayer resist for manufacturing
- - R.W. Kwong
  - M. Khojasteh
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Novel classes of cyclic olefin polymers for 193 nm lithography
- - P. Rao Varanasi
  - R.D. Allen
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- - Hiroshi Ito
  - G. Breyta
  - et al.
- 1997
- ACS Spring 1997