Publications

6 results for U. Schwalke

Charge trapping in SiO₂/HfO₂ gate dielectrics: Comparison between charge-pumping and pulsed I_D-V_G
- - A. Kerber
  - E. Cartier
  - et al.
- 2003
- INFOS 2003
Conference paper
Stress induced charge trapping effects in SiO₂/Al ₂O₃ gate stacks with TiN electrodes
- - A. Kerber
  - E. Cartier
  - et al.
- 2003
- Journal of Applied Physics
Paper
Characterization of the V_T-instability in SiO₂ / HfO₂ gate dielectrics
- - A. Kerber
  - E. Cartier
  - et al.
- 2003
- IRPS 2003
Conference paper
Charge trapping and dielectric reliability of SiO₂-Al₂O₃ gate stacks with TiN electrodes
- - Andreas Kerber
  - Eduard Cartier
  - et al.
- 2003
- IEEE Transactions on Electron Devices
Paper
Characterization of the V_T-instability in SIO₂/HFO₂ gate dielectrics
- - A. Kerber
  - E. Cartier
  - et al.
- 2003
- IRPS 2003
Conference paper
Origin of the threshold voltage instability in SiO₂/HfO₂ dual layer gate dielectrics
- - A. Kerber
  - E. Cartier
  - et al.
- 2003
- IEEE Electron Device Letters
Paper