Electrical activation in silicon-on-insulator after low energy boron implantation
- Antonio F. Saavedra
- Kevin S. Jones
- et al.
- 2004
- Journal of Applied Physics
Publications
6 results for A.F. Saavedra
Comparison of {311} Defect Evolution in SIMOX and Bonded SOI Materials
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- JES
Concentration dependence of boron-interstitial cluster (BIC) formation in silicon-on-insulator (SOI)
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- MRS Proceedings 2004
Kinetics of {3 1 1} defect dissolution in silicon-on-insulator (SOI)
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- Materials Science and Engineering: B
Secondary defect formation in bonded silicon-on-insulator after boron implantation
- A.F. Saavedra
- A.C. King
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Silicon self-interstitial cluster formation and dissolution in SOI
- A.F. Saavedra
- J. Frazer
- et al.
- 2002
- MRS Proceedings 2002