Publications

3 results for Zhi Liu

High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.