The effect of the OPC parameters on the performance of the OPC model
- Amr Abdo
- Ahmed Seoud
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
Conference paper
Publications
3 results for Ahmed Seoud
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paperThe effect of OPC optical and resist model parameters on the model accuracy, run time, and stability
- Amr Abdo
- Rami Fathy
- et al.
- 2006
- SPIE Photomask Technology 2006
Conference paper