Publications

3 results for Aleksandra Clancy

Graded spin-on organic bottom antireflective coating for high NA lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Trilayer development for 193 nm immersion lithography
- - Sean Burns
  - Martin Burkhardt
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Silicon containing polymer in applications for 193 nm high NA lithography processes
- - Scan Bums
  - Dirk Pfeiffer
  - et al.
- 2006
- SPIE Advanced Lithography 2006