Publications

2 results for Kenneth Goldberg

Thorough characterization of a EUV mask
- - Hiroyuki Mizuno
  - Gregory McIntyre
  - et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- - Patrick P. Naulleau
  - Clemens Rammeloo
  - et al.
- 2006
- SPIE Advanced Lithography 2006