Transistor-limited constant voltage stress of gate dielectricsB.P. LinderD.J. Franket al.2001VLSI Technology 2001
Calculating the error in long term oxide reliability estimatesB.P. LinderJ.H. Stathiset al.2001IRPS 2001
Calculating the error in long term oxide reliability estimatesB.P. LinderJ.H. Stathiset al.2001IRPS 2001
Modeling of energy distributions for plasma implantationBarry P. LinderNathan W. Cheung2001Surface and Coatings Technology
Breakdown measurements of ultra-thin SiO2 at low voltageJ.H. StathisA. Vayshenkeret al.2000VLSI Technology 2000
Gate oxide breakdown under Current Limited Constant Voltage StressB.P. LinderJ.H. Stathiset al.2000Digest of Technical Papers-Symposium on VLSI Technology